The dipping bath 321 includes a plurality of chemical liquid supply parts 321a and a pure water supply part 321b from which a plurality of types of chemical liquid or pure water are supplied through a supply tube. The dipping bath 321 further includes a drain 321d for receiving the processing fluid spilled over the dipping bath 321 as indicated by arrows 321F, and a drain part 321e for draining the processing fluid received from the drain 321d through a drain tube. Such a structure allows the dipping bath 321 to replace the processing fluid therein by various chemical liquid (diluted by pure water) or pure water while dipping the substrates W, thereby giving an appropriate cleaning to the substrates W.