TiN coating/glass substrate system fabricated for hot-embossing stamp at multi-scale
For the hot-embossing lithography, imprinting stamp with long-life span, good anti-wear property and precise geometrical shape, is much expected for pushing forward the technology to industrial application. By analyzing disadvantages of current Si and SiO2 imprinting stamps, this paper presents TiN coating/glass substrate system as the stamp material, in which the glass plates serves as substrate and the hard TiN coating is fabricated for the nano-patterns. To fabricate the stamp, firstly, several microns TiN coating is deposited on the glass by ion- beam deposition system, then focused ion beam etching system is used to fabricate a series of nano-patterns on the TiN coating. The primary hot-embossing imprinting results indicate good results for PMMA. Hereby it is believed that conventional hard coating TiN could be potentially a good choice for realizing the long-life imprinting and improving the life duration of the imprinting stamp greatly.