A Novel 90nm 8T SRAM Cell With Enhanced Stability
As the MOSFETs channel length is scaling down, SRAM stability becomes the major concern for future technology. The cell becomes more susceptible to both process induced variation in device geometry and threshold voltage variability due to dopant fluctuation in the channel region. In this paper , a novel highly stable 8T SRAM cell is proposed which eliminates any noise induction during read operation and keeps the Read SNM as high as 415 mV at VDD = 1.2 V in 90 nm technology. The cell also supports low power operation at Cell VDD as low as 0.41 V. This new asymmetric cell structure is capable of using differential sense technique for high speed read operation.