Evaluation of 300 mm wafer boxes with UV/photoelectron cleaning capability
New plastic wafer boxes with cleaning capability for gaseous contamination harmful to LSI fabrication processes have been developed. The contamination gases are effectively reduced by attaching a UV/photoelectron cleaning unit to the conventional polycarbonate plastic box. The performance of the wafer boxes has been verified by a reliability test of thin gate oxides fabricated on Si wafers stored in the boxes. It is also shown that a newly developed plastic material is superior to polycarbonate in terms of the organic molecule contaminants.